The CIT Photo patterning technology can be used in various aspects of modern display manufacture. The ability to additively pattern highly conductive metal tracks on both glass and plastic without expensive vacuum deposition and etching allows organic TFT backplanes to be produced efficiently and with high performance.
The ability to pattern ultra-fine lines alongside wide connector traces introduces the potential to augment or even replace ITO in these devices.
Finally, this technology offers a scalable approach, allowing a seamless transition from piecewise development to roll-to-roll manufacture.
CIT is currently working with partners on a development project.